By Samares Kar

"The publication comprehensively covers the entire present and the rising components of the physics and the expertise of excessive permittivity gate dielectric fabrics, together with, themes corresponding to MOSFET fundamentals and features, hafnium-based gate dielectric fabrics, Hf-based gate dielectric processing, steel gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack fabrics, ternary hafnia and lanthania established high-k gate stack motion pictures, crystalline high-k oxides, excessive mobility substrates, and parameter extraction. every one bankruptcy starts with the fundamentals invaluable for knowing the subject, via a entire evaluate of the literature, and finally graduating to the present prestige of the expertise and our clinical knowing and the longer term prospects."

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High Permittivity Gate Dielectric Materials: 43 (Springer Series in Advanced Microelectronics) by Samares Kar


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