By Alex Robinson,Richard Lawson

As the necessities of the semiconductor became extra hard when it comes to solution and pace it's been essential to push photoresist fabrics a ways past the functions formerly anticipated. presently there's major around the world examine attempt in to so known as subsequent new release Lithography concepts comparable to EUV lithography and multibeam electron beam lithography.

those advancements in either the commercial and the tutorial lithography arenas have resulted in the proliferation of diverse novel techniques to withstand chemistry and inventive extensions of conventional photopolymers. at the moment so much texts during this sector specialise in both lithography with might be one or chapters on resists, or on conventional face up to fabrics with really little attention of recent techniques.

This ebook consequently goals to assemble the worlds most efficient face up to improvement scientists from a few of the neighborhood to provide in a single position a definitive description of the various techniques to lithography fabrication.

  • Assembles up to date details from the world’s ideal withstand chemists and process improvement lithographers at the houses and services of the wide variety of withstand fabrics at the moment less than investigation
  • Includes info on processing and metrology techniques
  • Brings jointly a number of techniques to litho development recording from academia and in a single place

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Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience) by Alex Robinson,Richard Lawson

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